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用于去除废水中抗生素抗性细菌和抗生素抗性基因的光催化反应超滤膜

发布者:抗性基因网 时间:2021-06-25 浏览量:946

摘要

       生物废水处理不能有效去除抗生素抗性细菌 (ARB) 和抗生素抗性基因 (ARG)。在这项研究中,我们通过用氧化钛 (TiO2) 纳米粒子对聚偏二氟乙烯 (PVDF) 超滤 (UF) 膜进行功能化来制造光催化反应膜,用于从二次废水中去除 ARB 和 ARG。 TiO2 改性的 PVDF 膜提供了对 ARB 的完全保留和对 ARG 和整合子的有效光催化降解。具体而言,使用 TiO2 修饰的 PVDF 膜对 ARG(即质粒介导的 floR、sul1 和 sul2)的总去除效率在暴露于紫外线照射后达到约 98%。发现位于基因组中的 ARG 的光催化降解比位于质粒中的更有效。 UV 处理后整合子(即 intI1、intI2 和 intI3)的出色去除表明 ARG 的水平转移电位受到 TiO2 光催化反应的有效控制。我们还评估了 TiO2-UF 膜的防污性能,以证明其在废水处理中的潜在应用。

       Biological wastewater treatment is not effective in removal of antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs). In this study, we fabricated a photocatalytic reactive membrane by functionalizing polyvinylidene fluoride (PVDF) ultrafiltration (UF) membrane with titanium oxide (TiO2) nanoparticles for the removal of ARB and ARGs from a secondary wastewater effluent. The TiO2-modified PVDF membrane provided complete retention of ARB and effective photocatalytic degradation of ARGs and integrons. Specifically, the total removal efficiency of ARGs (i.e., plasmid-mediated floR, sul1, and sul2) with TiO2-modified PVDF membrane reached ∼98% after exposure to UV irradiation. Photocatalytic degradation of ARGs located in the genome was found to be more efficient than those located in plasmid. Excellent removal of integrons (i.e., intI1, intI2, and intI3) after UV treatment indicated that the horizontal transfer potential of ARGs was effectively controlled by the TiO2 photocatalytic reaction. We also evaluated the antifouling properties of the TiO2–UF membrane to demonstrate its potential application in wastewater treatment.

https://pubs.acs.org/doi/abs/10.1021/acs.est.8b01888