摘要

       本研究调查了通过高级氧化过程 (AOP)，即芬顿氧化 (Fe2 +/H2O2) 和 UV/H2O2 过程减少抗生素抗性基因 (ARG)、intI1 和 16S rRNA 基因的情况。 ARGs 包括来自市政污水的 sul1、tetX 和 tetG。结果表明，Fenton 氧化和 UV/H2O2 工艺可以有效地减少选定的 ARG。芬顿法的氧化略好于 UV/H2O2 法。特别是，对于 Fenton 氧化，在 Fe2+/H2O2 的摩尔比为 0.1，H2O2 浓度为 0.01 mol L- 1，pH 为 3.0，反应时间为 2 h，2.58-3.79 log 目标的最佳条件下基因被移除。在初始出水 pH 值条件下（pH = 7.0），去除量为 2.26-3.35 个对数。对于 UV/H2O2 过程，当 pH 为 3.5，H2O2 浓度为 0.01 mol L− 1 并伴随紫外线照射 30 分钟时，所有 ARGs 都可以实现 2.8-3.5 个对数的减少，在一个 pH 值下减少 1.55-2.32 个对数7.0。 Fenton 氧化和 UV/H2O2 过程遵循一级反应动力学模型。目标基因的去除受许多参数的影响，包括初始 Fe2+/H2O2 摩尔比、H2O2 浓度、溶液 pH 值和反应时间。在这些因素中，试剂浓度和 pH 值是 AOP 过程中最重要的因素。

       This study investigated the reduction of antibiotic resistance genes (ARGs), intI1 and 16S rRNA genes, by advanced oxidation processes (AOPs), namely Fenton oxidation (Fe2 +/H2O2) and UV/H2O2 process. The ARGs include sul1, tetX, and tetG from municipal wastewater effluent. The results indicated that the Fenton oxidation and UV/H2O2 process could reduce selected ARGs effectively. Oxidation by the Fenton process was slightly better than that of the UV/H2O2 method. Particularly, for the Fenton oxidation, under the optimal condition wherein Fe2 +/H2O2 had a molar ratio of 0.1 and a H2O2 concentration of 0.01 mol L− 1 with a pH of 3.0 and reaction time of 2 h, 2.58–3.79 logs of target genes were removed. Under the initial effluent pH condition (pH = 7.0), the removal was 2.26–3.35 logs. For the UV/H2O2 process, when the pH was 3.5 with a H2O2 concentration of 0.01 mol L− 1 accompanied by 30 min of UV irradiation, all ARGs could achieve a reduction of 2.8–3.5 logs, and 1.55–2.32 logs at a pH of 7.0. The Fenton oxidation and UV/H2O2 process followed the first-order reaction kinetic model. The removal of target genes was affected by many parameters, including initial Fe2 +/H2O2 molar ratios, H2O2 concentration, solution pH, and reaction time. Among these factors, reagent concentrations and pH values are the most important factors during AOPs.

 https://www.sciencedirect.com/science/article/abs/pii/S004896971630081X