摘要

这项工作研究了UV-C，UV-C /过硫酸盐和UV-C / H2O2在灭活对碳青霉烯类抗生素（CR-Kp的耐药性的肺炎克雷伯氏菌（Klebsiella pneumoniae）（CR-Kp，一种优先病原体，由于其快速繁殖和抗拒最后一种抗生素的能力）的单独应用）。在此，将城市污水处理厂的二次废水和预先接种CR-Kp的去离子水送入这三个过程。评估了细菌的灭活，对治疗过程中抗药性的影响，过程的残留作用，微生物的再生能力以及消除引起抗药性的基因。在两个水域中，在三个过程中发现了快速而全面的微生物去除：市政废水（180s）和去离子水（60s）。在含有碳青霉烯的选择性培养基中的可培养性评估表明，经UV-C / PS或UV-C / H2O2处理的细菌对抗生素的响应高于仅对UV-C的响应。对过程残留效应的分析表明，关闭光源后，过硫酸盐阴离子继续对细菌具有灭活作用。在去离子水中，停止处理24小时后，微生物没有再生长，这表明60秒钟的处理过程足以对耐药细菌造成不可弥补的损害。此外，抗性基因（blaKPC-3）的进化表明，该过程必须比细菌灭活所需的时间更长，以确保其消除。另外，观察到抗性基因的去除率按照以下顺序：UV-C / PS→＞ UV-C / H2O2→＞ UV-C。这些结果表明，UV-C和过硫酸盐在去除水中CR-Kp方面具有优越的潜力。

This work studies the individual application of UV-C, UV-C/persulfate and UV-C/H2O2 to inactivate Klebsiella pneumoniae resistant to carbapenem antibiotics (CR-Kp, one priority pathogen due to its fast propagation and capacity to resist last resort antibiotics). Herein, secondary effluent of municipal wastewater treatment plant and deionized water previously inoculated with CR-Kp were submitted to the three processes. Bacteria inactivation, effect on the resistance during treatments, residual action of processes, microorganism regrowth ability and elimination of the gene responsible for resistance were evaluated. A fast and total microorganism removal was found in the three processes in both waters: municipal wastewater (at 180 s) and deionized water (at 60 s). The cultivability evaluation in selective medium containing carbapenems indicated that the response to antibiotic of bacteria treated by UV-C/PS or UV-C/H2O2 is higher than the submitted to UV-C alone. The analysis of processes residual effect showed that persulfate anion continued the inactivating action on the bacteria when light was turned off. In deionized water, after 24 h of treatments cessation, the microorganism showed no regrowth, evidencing that 60 s of processes action was enough time to induce irreparable damages on the resistant bacteria. Additionally, the resistance gene (blaKPC-3) evolution showed that the processes must be extended more time than required for bacteria inactivation to ensure its elimination. Also, it was observed that the resistance gene removal rate followed the order: UV-C/PS > UV-C/H2O2 > UV-C. These results remark the superior potential of UV-C plus persulfate in the removal of CR-Kp in waters.

https://www.sciencedirect.com/science/article/pii/S2213343718300769