摘要

      抗生素耐药性的出现是对人类健康的一大威胁。本文研究了太阳光和太阳光Fenton工艺对抗生素耐药菌（ARB）的去除作用。因此，我们设计了一个实验方案，将具有不同药物敏感和耐药模式和结构（革兰氏阳性和革兰氏阴性）的几种细菌（金黄色葡萄球菌、大肠埃希菌和肺炎克雷伯菌）置于阳光下，在水中进行光芬顿氧化处理。结果表明，太阳光法和太阳光-Fenton法对水中ARB的去除均有效，对抗生素敏感和耐药菌株，太阳光消毒和太阳光-Fenton消毒所需时间基本相同（分别为180-240和90-120 min）。而且，细菌结构对治疗效果没有明显影响。与敏感菌株相比，在任何处理后的水中均未发现具有较高耐药性的细菌生长。最后，这两个过程都有效地减少AR基因（ARGs），尽管太阳光Fenton比太阳光更快。综上所述，太阳光Fenton工艺保证了ARB的有效消毒和水中（或废水）中ARGs的去除，是限制ARB和ARG在自然界传播的潜在手段。

      The emergence of antibiotic resistance represents a major threat to human health. In this work we investigated the elimination of antibiotic resistant bacteria (ARB) by solar light and solar photo-Fenton processes. As such, we have designed an experimental plan in which several bacterial strains (Staphylococcus aureus, Escherichia coli and Klebsiella pneumoniae) possessing different drug-susceptible and -resistant patterns and structures (Gram-positive and Gram-negative) were subjected to solar light and the photo-Fenton oxidative treatment in water. We showed that both solar light and solar photo-Fenton processes were effective in the elimination of ARB in water and that the time necessary for solar light disinfection and solar photo-Fenton disinfection were similar for antibiotic-susceptible and antibiotic-resistant strains (mostly 180-240 and 90-120 min, respectively). Moreover, the bacterial structure did not significantly affect the effectiveness of the treatment. Similar regrowth pattern was observed (compared to the susceptible strain) and no development of bacteria with higher drug-resistance values was found in waters after any treatment. Finally, both processes were effective to reduce AR genes (ARGs), although solar photo-Fenton was more rapid than solar light. In conclusion, the solar photo-Fenton process ensured effective disinfection of ARB and elimination of ARGs in water (or wastewater) and is a potential mean to ensure limitation of ARB and ARG spread in nature.

        https://www.sciencedirect.com/science/article/abs/pii/S0043135418305220?via%3Dihub