发布者:抗性基因网 时间:2023-06-06 浏览量:207
摘要
抗生素耐药性基因(ARGs)及其宿主抗生素耐药性细菌(ARB)在环境中被广泛检测到,并对人类健康构成威胁。水处理厂的传统消毒不能有效去除ARG和ARB。本研究探索了利用分级大孔Co3O4-SiO2(MM-CS)催化剂活化过氧一硫酸盐(PMS)以灭活ARB和降解细胞内ARG的非均相类光Fenton工艺的潜力。一种典型的革兰氏阴性抗生素耐药性细菌称为假单胞菌。HLS-6被用作ARB模型。在可见光和中性pH条件下,基于MM-CS的异质光Fenton样工艺在30秒内实现了~107CFU/mL的ARB完全灭活,并且在60分钟内实现了特定ARG(sul1和intI1)超过4.0 log的有效去除率。机理研究表明,•O2−和1O2是ARB失活和ARG降解的重要反应物种。提出了活性物种的形成和转化。此外,MM-CS的分级宏观介孔结构提供了优异的光学和光电化学性质,促进了Co3+/Co2+的循环和PMS的有效利用。该工艺已被验证在各种水基质中有效,包括去离子水、地下水、水源水和二次出水。总之,这项工作表明,基于MM-CS的异质光Fenton样过程是一种很有前途的控制抗生素耐药性在水生环境中传播的技术。
Abstract
Antibiotic resistance genes (ARGs) and their host antibiotic-resistant bacteria (ARB) are widely detected in the environment and pose a threat to human health. Traditional disinfection in water treatment plants cannot effectively remove ARGs and ARB. This study explored the potential of a heterogeneous photo-Fenton-like process utilizing a hierarchical macro-mesoporous Co3O4-SiO2 (MM CS) catalyst for activation of peroxymonosulfate (PMS) to inactivate ARB and degrade the intracellular ARGs. A typical gram-negative antibiotic-resistant bacteria called Pseudomonas sp. HLS-6 was used as a model ARB. A completed inactivation of ARB at ∼107 CFU/mL was achieved in 30 s, and an efficient removal rate of more than 4.0 log for specific ARGs (sul1 and intI1) was achieved within 60 min by the MM CS-based heterogeneous photo-Fenton-like process under visible light and neutral pH conditions. Mechanism investigation revealed that •O2− and 1O2 were the vital reactive species for ARB inactivation and ARG degradation. The formation and transformation of the active species were proposed. Furthermore, the hierarchical macro-mesoporous structure of MM CS provided excellent optical and photoelectrochemical properties that promoted the cycle of Co3+/Co2+ and the effective utilization of PMS. This process was validated to be effective in various water matrices, including deionized water, underground water, source water, and secondary effluent wastewater. Collectively, this work demonstrated that the MM CS-based heterogeneous photo-Fenton-like process is a promising technology for controlling the spread of antibiotic resistance in aquatic environments.
https://www.sciencedirect.com/science/article/abs/pii/S0304389421023827